Flash Lamp Annealing: From Basics to Applications [Paperback]

This book provides a comprehensive survey of the technology of flash lamp annealing (FLA) for thermal processing of semiconductors. It gives a detailed introduction to the FLA technology and its physical background. Advantages, drawbacks and process issues are addressed in detail and allow the reader to properly plan and perform their own thermal processing. Moreover, this books gives a broad overview of the applications of flash lamp annealing, including a comprehensive literature survey. Several case studies of simulated temperature profiles in real material systems give the reader the necessary insight into the underlying physics and simulations. This book is a valuable reference work for both novice and advanced users.

Introduction.- Technological background.- Basic components.- Flash lamps.- Process management and process control.- FLA assisted deposition.- Temperature.- Thermal budget.- Temperature measurements.- Temperature simulations.- FLA for semiconductors.- Defect engineering.- Doping.- Crystallization.- Semiconductor nanostructures.- Beyond semiconductors.- Transparent conducting oxides.- Metallic films.- High-k materials and dielectrics.- Flexible substrates.- Outlook.

Lars Rebohle received a Diplom in physics from the Technical University of Dresden in 1995. From 1996 to 2001 he was employed at the Dresden-Rossendorf Research Centre, now Helmholtz-Zentrum Dresden-Rossendorf (HZDR), working on the luminescence properties of ion-implanted, nanocrystalline SiO2 layers. He received his Ph.D. in 1999. After a post-doctoral stay at the Technical University in Vienna in 2002, he worked from 2003 to 2006 in industry dealing with ion implantation, flash lamp annealing and thin film deposition. Since 2007, he has been working as a scientist at the HZDR and engaged in research on Si-based light emitters with rare earth elements. His current research topics include the doping, crystallization and annealing oflÃ&