Ion-Solid Interactions Fundamentals and Applications [Paperback]

Comprehensive guide to an important materials science technique for students and researchers.This book describes how materials from semiconductors to tool steels can be modified to create new materials. Its main purpose is to describe how ion beams penetrate into the material and modify its properties. Its importance is that it is the first book in two decades that describes completely the implantation process which is used universally in semiconductor production and now is used to modify metals for commercial applications. It differs from most of the competing books as it is a textbook for students and specialist rather than an edited volume of a collection of papers.This book describes how materials from semiconductors to tool steels can be modified to create new materials. Its main purpose is to describe how ion beams penetrate into the material and modify its properties. Its importance is that it is the first book in two decades that describes completely the implantation process which is used universally in semiconductor production and now is used to modify metals for commercial applications. It differs from most of the competing books as it is a textbook for students and specialist rather than an edited volume of a collection of papers.Modern technology depends on materials with precisely controlled properties. Ion beams are an excellent way to achieve controlled modification of surface and near-surface regions. In every integrated circuit production line, for example, there are ion implantation systems. In addition to integrated circuit technology, ion beams can modify the mechanical, tribological, and chemical properties of metal, intermetallic, and ceramic materials without altering their bulk properties. Ion-solid interactions are the foundation that underlies the broad application of ion beams to the modification of materials. This text covers the fundamentals and applications of ion-solid interactions, and is aimed at graduate students and researchers intl#²