Plasma-Surface Interactions and Processing of Materials [Hardcover]

An understanding of the processes involved in the basic and applied physics and chemistry of the interaction of plasmas with materials is vital to the evolution of technologies such as those relevant to microelectronics, fusion and space.
The subjects dealt with in the book include: the physics and chemistry of plasmas, plasma diagnostics, physical sputtering and chemical etching, plasma assisted deposition of thin films, ion and electron bombardment, and plasma processing of inorganic and polymeric materials.
The book represents a concentration of a substantial amount of knowledge acquired in this area - knowledge which was hitherto widely scattered throughout the literature - and thus establishes a baseline reference work for both established and tyro research workers.Basic Physics of Plasmas/Discharges: Production of Active Species.- Plasma Chemistry in Etching.- Optical Diagnostic Techniques for Low Pressure Plasma Processing.- Measuring Eedf in Gas Discharge Plasmas.- Transport Phenomena in Plasma Processing.- Kinetics of a Low-Pressure H2 Multipole Discharge Used for GaAs Treatment.- Ar and Ti Excited States in the Vicinity of the Substrate during Magnetron Sputtering of Ti.- Modeling of the Plasma Nitriding Process.- Plasma Measurements in a Magnetron Sputtering Device.- Laser Induced Fluorescence Measurements of Ion Distribution Functions.- Laser Induced Fluorescence Measurements in Plasma Etching Processes.- Effect of Modulation on the Plasma Deposition of Hydrogenated and Fluorinated Silicon Nitride.- Partial Pressure Analysis of CF4/O2 Plasmas.- Surface Characterization of Corona Discharge Treated Poly (Ethylene Terephthalate).- The Physics of the Sputter Erosion Process.- Basic Phenomena in Reactive Etching of Materials.- Particle Bombardment Effects in thin Film Deposition.- Low-Energy Ion/Surface Interactions during Film Growth from the Vapor Phase: Effects on Nucleation and Growth Kinetics, Defect Structure, and EllcŒ