Chemical Solution Deposition of Functional Oxide Thin Films [Paperback]

This is the first text to cover all aspects of?solution processed?functional oxide thin-films. Chemical Solution Deposition (CSD) comprises all solution based thin- film deposition techniques, which involve chemical reactions of precursors during the formation of the oxide films, i. e. sol-gel type routes, metallo-organic decomposition routes, hybrid routes, etc. While the development of sol-gel type processes for optical coatings on glass by silicon dioxide and titanium dioxide dates from the mid-20th century, the first CSD derived electronic oxide thin films, such as lead zirconate titanate, were prepared in the 1980s. Since then CSD has emerged as a highly flexible and cost-effective technique for the fabrication of a very wide variety of functional oxide thin films. Application areas include, for example, integrated dielectric capacitors, ferroelectric random access memories, pyroelectric infrared detectors, piezoelectric micro-electromechanical systems, antireflective coatings, optical filters, conducting-, transparent conducting-, and superconducting layers, luminescent coatings, gas sensors, thin film solid-oxide fuel cells, and photoelectrocatalytic solar cells. In the appendix detailed cooking recipes for selected material systems are offered.

Chemical Solution Deposition (CSD) is a highly-flexible and inexpensive technique for the fabrication of functional oxide thin films. Featuring nearly 400 illustrations, this text covers all aspects of the technique.

Introduction.-Solution Chemistry;Simple alkoxide based precursor systems;Carboxylate based precursor systems;Single-source precursors;Acqueos Precursor Systems; Solution Synthesis Strategies.-Analytical Methods; Introduction;Thermal Analysis;NMR Sepctroscopy;EXAFS; Other Methods (XRM, SEM,TEM;scattering methods at nanocrystalline films);Spin-Coating;Dip Coating; Inkjet Printing and Other Direct Writing Methods(dip point and imprint techniques);Chemical Bath Depositilsš