Plasma Etching Fundamentals and Applications [Hardcover]

This book focuses on the remarkable recent advances in understanding low pressure radio frequency glow discharges. It explains the basic analytical theory, plasma physics, and plasma diagnostics, before proceeding to the details of the etching process.

1. Introduction
2. RF discharges
3. Physical basis of plasma etching process
4. Diagnostics of plasma particles and potentials
5. Technology of reactive ion etching
6. Magentic field coupled etchers
7. ECR plasma etchers
8. Future prospects
Index