Plasma Processing of Semiconductors [Hardcover]

Plasma Processing of Semiconductors contains 28 contributions from 18 experts and covers plasma etching, plasma deposition, plasma-surface interactions, numerical modelling, plasma diagnostics, less conventional processing applications of plasmas, and industrial applications.
Audience: Coverage ranges from introductory to state of the art, thus the book is suitable for graduate-level students seeking an introduction to the field as well as established workers wishing to broaden or update their knowledge.Proceedings of the NATO Advanced Study Institute, Ch?teau de Bonas, France, 17-28 June 1996Plasma Processing of Semiconductors contains 28 contributions from 18 experts and covers plasma etching, plasma deposition, plasma-surface interactions, numerical modelling, plasma diagnostics, less conventional processing applications of plasmas, and industrial applications.
Audience: Coverage ranges from introductory to state of the art, thus the book is suitable for graduate-level students seeking an introduction to the field as well as established workers wishing to broaden or update their knowledge.Preface. Plasma Etching: Introduction to Plasma Etching; T.D. Mantei. Plasma Chemistry, Basic Processes and PECVD; D.L. Flamm. The Role of Ions in Reactive Ion Etching with Low Density Plasmas; J.W. Coburn. SiO2 Etching in High-Density Plasmas: Differences with Low-Density Plasmas; G.S. Oehrlein. Plasma Deposition: Introduction to Plasma Enhanced Chemical Vapor Deposition; T.S. Cale, et al. Topography Evolution During Semiconductor Processing; T.S. Cale, et al. Deposition of Amorphous Silicon; J. Perrin. Plasma Sources: High Density Sources for Plasma Etching; T.D. Mantei. Resonant Plasma Excitation by Electron Cyclotron Waves - Fundamentals and Applications; H. Oechsner. The Transition from Capacitive to Inductive to Wave Sustained Discharges;lÓ)